Ion beam assist sputtering apparatus and ion beam assist sputtering method

摘要

A target; a sputter ion source that irradiates the target with sputter ions and knocks out some of the constituent particles of the target; and a film formation region in which a base material for depositing the particles knocked out of the target An assist ion beam irradiation apparatus that irradiates an assist ion beam from an oblique direction with respect to a normal direction of a film formation surface of the base material installed in the film formation region; The sputter ion source has a plurality of ion guns arranged so that a sputter ion beam can be irradiated from one end of the target to the other end, and the sputter ion beams of the plurality of ion guns An ion beam assisted sputtering apparatus, wherein a current value for generating each is set.