Method for producing a transparent conductive film, the manufacturing apparatus of the transparent conductive film, transparent conductive film and sputtering target

摘要

Provides can not be used SOLVED] steam, to form a transparent conductive film having conductive properties and etching characteristics good, the method for producing a transparent conductive film. A first component consisting of indium oxide, a second component consisting of tin oxide, method for producing a transparent conductive film according to an embodiment of the present invention comprises, La, Nd, Dy, Eu, Gd, Tb , by sputtering a target material comprising a third component consisting of an oxide of, or at least one element selected from Zr, Al, Si, and B and Ti, indium tin oxide thin film on a substrate and includes a step of forming, a step of patterning an etching solution the indium tin oxide thin film, and a step of crystallization by heat treatment of the indium tin oxide thin film. Thus, ITO film immediately after deposition is also now etchable a weak acid, it is possible to impart conductivity to the desired characteristics of the ITO film. [Selection Figure Figure 4