METHOD OF GENERATING A BIAS-ADJUSTED LAYOUT DESIGN OF A CONDUCTIVE FEATURE AND METHOD OF GENERATING A SIMULATION MODEL OF A PREDEFINED FABRICATION PROCESS

摘要

A method of generating a bias-adjusted layout design of a conductive feature includes receiving a layout design of the conductive feature. If a geometry configuration of the layout design is within a first set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a first layout bias rule. If the geometry configuration of the layout design is within a second set of predetermined criteria, the bias-adjusted layout design of the conductive feature is generated according to a second layout bias rule.