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NONVOLATILE MEMORY ELEMENT, MANUFACTURING METHOD THEREOF, NONVOLATILE MEMORY DEVICE, AND DESIGN SUPPORT METHOD FOR NONVOLATILE MEMORY ELEMENT

机译:非易失性存储器元件,其制造方法,非易失性存储器以及非易失性存储器元件的设计支持方法

摘要

A nonvolatile memory element includes a variable resistance layer located between a lower electrode and an upper electrode and having a resistance value that reversibly changes based on electrical signals applied between these electrodes. The variable resistance layer includes at least two layers: a first variable resistance layer including a first transition metal oxide; and a second variable resistance layer including a second transition metal oxide and a transition metal compound. The second transition metal oxide has an oxygen content atomic percentage lower than an oxygen content atomic percentage of the first transition metal oxide, the transition metal compound contains either oxygen and nitrogen or oxygen and fluorine, and the second transition metal oxide and the transition metal compound are in contact with the first variable resistance layer.
机译:非易失性存储元件包括可变电阻层,该可变电阻层位于下部电极和上部电极之间,并且具有基于施加在这些电极之间的电信号而可逆地改变的电阻值。可变电阻层包括至少两层:第一可变电阻层,其包括第一过渡金属氧化物;以及第二可变电阻层。第二电阻变化层包括第二过渡金属氧化物和过渡金属化合物。第二过渡金属氧化物的氧含量原子百分比低于第一过渡金属氧化物的氧含量原子百分比,过渡金属化合物包含氧和氮或氧和氟,以及第二过渡金属氧化物和过渡金属化合物与第一可变电阻层接触。

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