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METHOD OF GENERATING STANDARD CELL LIBRARY FOR DPL PROCESS AND METHODS OF PRODUCING A DPL MASK AND CIRCUIT PATTERN USING THE SAME
METHOD OF GENERATING STANDARD CELL LIBRARY FOR DPL PROCESS AND METHODS OF PRODUCING A DPL MASK AND CIRCUIT PATTERN USING THE SAME
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机译:生成用于DPL过程的标准单元库的方法以及使用该方法生成DPL掩码和电路图形的方法
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摘要
A method of constructing a standard cell library for double patterning lithography (DPL) includes dividing a standard cell into a first region determined not to have an interaction with an adjacent outer cell and a second region that is likely to have such an interaction, generating data representative of DPL patterns corresponding to the first and second regions, and generating a standard cell library made up of the data. The library is then accessed and used to form a DPL mask. The DPL mask can be used to form a pattern on a substrate made up of a layout of cells in which the pattern of the standard cell is duplicated at several locations in the layout.
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