METHOD FOR GENERATING A STANDARD CELL LIBRARY FOR DPL PROCESS AND A METHOD FOR GENERATING A DPL MASK USING THE SAME

摘要

PURPOSE: A method for generating a standard cell library for a DPL(Double Patterning Lithography) process and a method for rapidly generating a DPL mask using the same are provided to reduce separation time by separating a pattern to construct a database. CONSTITUTION: A standard cell is separated into a first region and a second region(S300). An interaction is not generated between the first region and an external cell. An interaction is generated between the external cell and the second region. A DPL separation pattern is generated in the first region and the second region(S310). A standard cell library with the DPL separation pattern is generated(S330). [Reference numerals] (AA) Start; (BB) End; (S300) Separating a standard cell into a first region without interaction with a first external cell and a second external cell and second and third regions having interaction with an external cell; (S310) Generating one DPS separation pattern for the first region; (S320) Generating multiple DPS separation patterns for second and third regions according to the interaction of the first external cell and the second external cell; (S330) Generating a standard cell library including the generated respective DPL separation pattern;