首页> 外国专利> Wafer precursor prepared for group III nitride epitaxial growth on a composite substrate having diamond and silicon carbide layers, and semiconductor laser formed thereon

Wafer precursor prepared for group III nitride epitaxial growth on a composite substrate having diamond and silicon carbide layers, and semiconductor laser formed thereon

机译:为在具有金刚石和碳化硅层的复合衬底上外延生长III族氮化物而准备的晶片前驱体以及在其上形成的半导体激光器

摘要

A high power, wide-bandgap device is disclosed that exhibits reduced junction temperature and higher power density during operation and improved reliability at a rated power density. The device includes a diamond substrate for providing a heat sink with a thermal conductivity greater than silicon carbide, a single crystal silicon carbide layer on the diamond substrate for providing a supporting crystal lattice match for wide-bandgap material structures that is better than the crystal lattice match of diamond, and a Group III nitride heterostructure on the single crystal silicon carbide layer for providing device characteristics.
机译:公开了一种高功率,宽带隙器件,该器件在操作过程中具有降低的结温和较高的功率密度,并在额定功率密度下具有更高的可靠性。该装置包括:金刚石基板,用于提供导热系数大于碳化硅的散热器;金刚石基板上的单晶碳化硅层,用于为宽带隙材料结构提供优于晶格的支撑晶格匹配金刚石的匹配,以及在单晶碳化硅层上的III族氮化物异质结构,以提供器件特性。

著录项

  • 公开/公告号US8513672B2

    专利类型

  • 公开/公告日2013-08-20

    原文格式PDF

  • 申请/专利权人 ADAM WILLIAM SAXLER;

    申请/专利号US20100952278

  • 发明设计人 ADAM WILLIAM SAXLER;

    申请日2010-11-23

  • 分类号H01L29/26;H01S5;

  • 国家 US

  • 入库时间 2022-08-21 16:47:18

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