Mask used for fabrication of microlens, and fabrication method for microlens using the mask

摘要

A fabrication method is provided which makes it possible to obtain a microlens that is more tightly spaced (the space between individual microlenses is smaller) than in the related art, even when the same fabrication process as that in the related art is used. The present invention provides a mask used for fabrication of a microlens to irradiate a photosensitive microlens material on a substrate with a patterned light beam, including a main layout, and a sub-layout provided around the main layout, in which when the mask is irradiated with a light beam, a first beam pattern is obtained by the main layout at a position corresponding to a center portion of the microlens, and a second beam pattern separated (resolved) from the first beam pattern is obtained by the sub-layout around the first beam pattern.