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Gate oxide breakdown-withstanding power switch structure

机译:耐氧化栅击穿功率开关结构

摘要

The present invention proposes a gate oxide breakdown-withstanding power switch structure, which is connected with an SRAM and comprises a first CMOS switch and a second CMOS switch respectively having different gate-oxide thicknesses or different threshold voltages. The CMOS switch, which has a normal gate-oxide thickness or a normal threshold voltage, provides current for the SRAM to wake up the SRAM from a standby or sleep mode to an active mode. The CMOS switch, which has a thicker gate-oxide thickness or a higher threshold voltage, provides current for the SRAM to work in an active mode. The present invention prevents a power switch from gate-oxide breakdown lest noise margin, stabilization and performance of SRAM be affected.
机译:本发明提出了一种耐栅氧化层击穿的功率开关结构,该结构与SRAM连接,并包括分别具有不同的栅氧化层厚度或不同的阈值电压的第一CMOS开关和第二CMOS开关。具有正常栅氧化层厚度或正常阈值电压的CMOS开关为SRAM提供电流,以将SRAM从待机或睡眠模式唤醒到活动模式。具有较厚的栅极氧化物厚度或较高的阈值电压的CMOS开关为SRAM提供电流以使其处于活动模式。本发明防止了功率开关的栅极氧化物击穿,以免影响噪声容限,SRAM的稳定性和性能。

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