AN AUTOMATIC GAS DELIVERY SYSTEM FOR DIFFUSION OF DOPANT IN SILISON USING A LIQUID DOPANT SOURCE SUCH AS PHOSPHOROUS OXYCHLORIDE (POCI3)

摘要

This invention relates to an automatic gas delivery system for dopant diffusion in semiconductors using a liquid diffusion source. It works on the basis of a PLC based controller module (1.1), a display cum keyboard panel (1.6), a relay card (1.2) and a manifold of electro-pneumatic solenoid valves (1.3) actuating a set of corresponding pneumatic valves in a combination of sequences allowing a flow of carrier gas (N2) through a bubbler containing liquid dopant source, reactant gas (O2) and dilution gas (N2) through different routes of gas manifold for mixing inside the diffusion furnace for the purpose of dopant diffusion in semiconductors.