Device and method of use thereof for the infiltration of porous preforms with liquid metals of high vapor pressure.

摘要

Device and method of use thereof for the infiltration of porous preforms with liquid metals of high vapor pressure, this being greater than 10 {sup, -3} mmHg, which is mounted inside a chamber and comprises conventional infiltration a porous preform, a crucible infiltration harboring turn said porous preform and the metal to be infiltrated therein by pressurization gas, a crucible saturation arranged such that it is inverted from the crucible infiltration covering and thus forming closed chamber saturation, easy to install, adaptable to any conventional device infiltration and preventing appreciable loss of metal, thereby enabling the process of metal infiltration into the pore space of the preform.