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A METHOD FOR CALCULATING AN OFFSET VALUE FOR ALIGNED DEPOSITION OF A SECOND PATTERN ONTO A FIRST PATTERN
A METHOD FOR CALCULATING AN OFFSET VALUE FOR ALIGNED DEPOSITION OF A SECOND PATTERN ONTO A FIRST PATTERN
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机译:一种将第二种图案对齐沉积到第一幅图案上的偏移值的计算方法
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摘要
A method for calculating an offset value for aligned deposition of a second pattern onto a first pattern, comprising steps of: (a) loading a substrate with the first pattern on a surface of the substrate into a pattern recognition device at an original position inside the pattern recognition device; (b) determining a coordinate of a prescribed point of the first pattern by the pattern recognition device; (c) superimposing the second pattern onto the first pattern on the surface of the substrate; (d) bringing back the substrate with the first pattern and the second pattern into the original position inside the pattern recognition device; (e) determining a coordinate of a prescribed point of the second pattern by the pattern recognition device; wherein the prescribed point of the first pattern corresponds to the prescribed point of the second pattern; and (f) calculating the offset value between the first pattern and the second pattern.
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