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SYSTEMS AND METHODS FOR MECHANICAL AND/OR CHEMICAL-MECHANICAL POLISHING OF MICROFEATURE WORKPIECES

机译:微特征工件的机械和/或化学机械抛光的系统和方法

摘要

Systems (100) and methods for polishing microfeature workpieces (112). In one embodiment, a method includes determining a status of a characteristic of a microfeature workpiece (112) and moving a carrier head (130) and/or a polishing pad (140) relative to the other to rub the microfeature workpiece (112) against the polishing pad (140) after determining the status of the characteristic of the microfeature workpiece. The carrier head also carries a plurality of piezoelectric members (150). The method further includes applying pressure against a back side of the microfeature workpiece (112) in response to the determined status of the characteristic by energizing at least one of the plurality of piezoelectric members (150). In another embodiment, a system includes a workpiece carrier assembly, a plurality of piezoelectric members (150), a polishing pad, a metrology tool for determining a status of the characteristic, and a controller. The controller can have a computer-readable medium containing instructions to perform the above-mentioned method.
机译:用于抛光微特征工件(112)的系统(100)和方法。在一个实施例中,一种方法包括:确定微特征工件(112)的特性的状态,以及相对于彼此移动承载头(130)和/或抛光垫(140),以摩擦微特征工件(112)。在确定微特征工件的特征状态之后,抛光垫(140)被抛光。承载头还承载多个压电构件(150)。该方法还包括响应于所确定的特征状态,通过给多个压电构件(150)中的至少一个通电来对微特征工件(112)的背面施加压力。在另一个实施例中,一种系统包括:工件载体组件,多个压电构件(150),抛光垫,用于确定所述特性的状态的计量工具以及控制器。控制器可以具有包含指令以执行上述方法的计算机可读介质。

著录项

  • 公开/公告号EP1633526B1

    专利类型

  • 公开/公告日2013-04-03

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC;

    申请/专利号EP20040750649

  • 发明设计人 ELLEDGE JASON B.;

    申请日2004-04-26

  • 分类号B24B1/00;

  • 国家 EP

  • 入库时间 2022-08-21 16:35:32

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