METHOD FOR PREPARING CONDUCTING FILM ON ULTRA-THIN GLASS SUBSTRATE, LCD SUBSTRATE, LIQUID CRYSTAL PANEL, AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

The present invention relates to a method for preparing a conducting film on an ultra-thin glass substrate. A magnetron sputtering method is adopted, initial magnetron sputtering power and/or initial argon flow are set to deposit a conducting film, a pressure sensor disposed on the ultra-thin glass substrate detects a film layer stress of the conducting film, and the magnetron sputtering power and/or the argon flow are adjusted in real time according to the detected film layer stress, so that the absolute value of the film layer stress is maintained below a predetermined value, the thickness of the ultra-thin glass substrate being less than or equal to 0.1 mm.