COLLOIDAL NEAR FIELD LITHOGRAPHY METHOD USING A BEAM WITH SPATIALLY MODULATED INTENSITY DISTRIBUTION

摘要

The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying colloid spheres into this region, a colloid sphere monolayer is formed. The thus applied colloid sphere monolayer exhibits a certain geometrical symmetry. Said colloid sphere monolayer is then illuminated with a beam of spatially modulated intensity distribution synchronized to said monolayer, thereby performing mechanical structuring in said region in conformity with a de¬ sired pattern through concentrating beam intensity via near-field effect behind said colloid sphere monolayer in the propagation direction of light.