COMPOSITE OXIDE SINTER, PROCESS FOR PRODUCING AMORPHOUS COMPOSITE OXIDE FILM, AMORPHOUS COMPOSITE OXIDE FILM, PROCESS FOR PRODUCING CRYSTALLINE COMPOSITE OXIDE FILM, AND CRYSTALLINE COMPOSITE OXIDE FILM

摘要

Provided is an amorphous film substantially comprised of indium, tin, calcium and oxygen, wherein tin is contained at a ratio of 5 to 15% based on an atomicity ratio of Sn / (In + Sn + Ca) and calcium is contained at a ratio of 0.1 to 2.0% based on an atomicity ratio of Ca / (In + Sn + Ca), and remnant is indium and oxygen. The film can be further crystallized by annealing at a temperature of 260°C or lower in which resistivity of the film will be 0.4m © cm or less. An ITO thin film for use as a display electrode or the like in a flat panel display can be made into an amorphous ITO film by way of sputter deposition without heating the substrate or adding water during deposition. This ITO film is characterized in that it will crystallize by annealing at a temperature of 260°C or less, which is not such a high temperature, and have low resistivity after being crystallized. Thus, the present invention aims to provide a method of producing such a film and a sintered compact for producing such a film.