首页> 外国专利> THICKENED ETCHING COATING LIQUID, AND METHOD FOR SELECTIVELY ETCHING SUNLIGHT POWER GENERATION ELEMENT SUBSTRATE FOR SOLAR CELL USING THE THICKENED ETCHING COATING LIQUID

THICKENED ETCHING COATING LIQUID, AND METHOD FOR SELECTIVELY ETCHING SUNLIGHT POWER GENERATION ELEMENT SUBSTRATE FOR SOLAR CELL USING THE THICKENED ETCHING COATING LIQUID

机译:厚膜蚀刻液,以及使用厚膜蚀刻液选择性地蚀刻太阳能电池的太阳光产生元素基质的方法

摘要

A HIGH VISCOSITY ETCHANT AND A SELECTIVE ETCHING METHOD FOR PHOTOVOLTAIC ELEMENT SUBSTRATES OF SOLAR CELLS USING THE SAME A main subject of the present invention is to provide a high viscosity etchant EL and a selective etching method using the same which etches a photovoltaic element substrate to a set depth concretely and does not spread undesirably. The high viscosity etchant EL of the present invention comprises an etchant being an alkaline solution for etching a photovoltaic element substrate 12; a viscosity increasing additive derived from a plant for increasing a viscosity of the etchant EL. The selective etching method comprises applying the high viscosity etchant EL to a surface of the photovoltaic element substrate 12; reacting the high viscosity etchant EL and the photovoltaic element substrate 12 by heating them; washing the photovoltaic element substrate 12 with pure water.
机译:使用相同的太阳能电池的光电元件基体的高粘度蚀刻剂和选择性蚀刻方法本发明的主要目的是提供一种高粘度蚀刻剂EL和使用其的选择性蚀刻方法,其将光伏元件基板蚀刻至具体设定深度,并且不会不希望地扩散。本发明的高粘度蚀刻剂EL包括:作为碱性溶液的蚀刻剂,用于蚀刻光伏元件基板12;以及作为蚀刻剂的碱性溶液。用于提高蚀刻剂EL的粘度的来自工厂的增粘添加剂。选择性蚀刻方法包括将高粘度蚀刻剂EL施加到光电元件基板12的表面上;以及将光敏蚀刻剂EL施加到光电元件基板12的表面上。通过加热使高粘度蚀刻剂EL和光电元件基板12反应;用纯水清洗光伏元件基板12。

著录项

  • 公开/公告号EP2224471A4

    专利类型

  • 公开/公告日2013-01-09

    原文格式PDF

  • 申请/专利权人 TEOSS CO. LTD.;

    申请/专利号EP20070859875

  • 发明设计人 MURAI TSUYOSHI;KONAKA TOSHINORI;

    申请日2007-12-20

  • 分类号H01L31/0224;H01L31/04;H01L21/306;H01L31/068;H01L31/18;

  • 国家 EP

  • 入库时间 2022-08-21 16:34:02

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