NANOIMPRINTING METHOD, NANOIMPRINTING APPARATUS FOR EXECUTING THE NANOIMPRINTING METHOD, AND METHOD FOR PRODUCING PATTERNED SUBSTRATES

摘要

To enable a resist pattern having dimensions different by a desired percentage(ΔDall) from the dimensions of a pattern of a mold under predetermined standard conditions(Pst,Tst) to be formed. The Young's modulus(Em) and the coefficient of thermal expansion(αm) of the mold(1) are different from those(Ei,αi) of the substrate(7). Resist(6) is cured within a pressure vessel while the pressure P inside the vessel and the temperature T of the assembly(8) are controlled to satisfy the next formula. ΔDall=(1/Ei-1/Em)･(P-Pst)+(αm-αi)･(T-Tst)