DEVICE AND METHOD FOR USING SAME TO INFILTRATE POROUS PREFORMS WITH LIQUID METALS HAVING HIGH VAPOUR PRESSURE

摘要

The invention relates to a device and a method for using same to infiltrate porous preforms with liquid metals having high vapour pressure, said pressure being higher than 10^-3 mmHg, which is installed inside a conventional infiltration chamber and includes a porous preform, an infiltration crucible which in turn contains said porous preform and the metal to be infiltrated into said preform by means of gas pressurisation, a saturation crucible arranged such as to be inverted relative to the infiltration crucible, covering same and thus forming a closed saturation chamber that is easy to install, adaptable to any conventional infiltration device and avoids any substantial loss of metal, thus enabling the metal infiltration process to be performed in the porous space of the preform.