SUBSTRATE PROCESSING DEVICE CAPABLE OF REDUCING OPERATING COSTS AND AN OPERATING METHOD THEREOF

摘要

PURPOSE: A substrate processing device and an operating method thereof are provided to discharge treatment solutions, into which a gas is injected, onto substrates.;CONSTITUTION: A first pipe(122) includes a first end and a second end. A treatment solution(124) flows in the first pipe. A second pipe(132) includes a first end and a second end. A gas(134) is transferred by the second pipe. A treatment solution supply unit supplies the treatment solution to a head unit(140) through the first pipe. A gas supply unit supplies a gas to the treatment solution through the second pipe.;COPYRIGHT KIPO 2013