APPARATUS AND A METHOD FOR DEPOSITION OF A SILICONE-BASED NANO-PARTICLE THIN FILM, IN WHICH THE INJECTION SPEED OF NANO-PARTICLES AND THE HEIGHT OF A SUBSTRATE ARE REGULATED

摘要

PURPOSE: An apparatus and a method for deposition of a silicone-based nano-particle thin film are provided to effectively deposit nano-particles on a substrate without a separate nano-particle transfer unit because the nano-particles are injected into a deposition chamber by the pressure difference between the deposition chamber and a nano-particle container.;CONSTITUTION: An apparatus for deposition of a silicone-based nano-particle thin film comprises a nano-particle container(100) and a deposition chamber(200). Silicon-based nano-particles are led by carrier gas and collected in the nano-particle container. The nano-particles in the nano-particle container are injected into the deposition chamber by the pressure difference between the nano-particle container and the deposition chamber and deposited on a substrate(S) placed in the deposition chamber. A first inlet line(102) is provided between the nano-particle container and the deposition chamber. A flow controller is provided in the first inlet line.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Nano particles + gas; (BB) Reaction gas; (CC) Nano particles