首页> 外国专利> THIN FILM TRANSISTOR SUBSTRATE WHICH MINIMIZES A PHENOMENON IN WHICH COMMON VOLTAGE PROVIDED TO A COMMON ELECTRODE IS DISTORTED AND A MANUFACTURING METHOD THEREOF

THIN FILM TRANSISTOR SUBSTRATE WHICH MINIMIZES A PHENOMENON IN WHICH COMMON VOLTAGE PROVIDED TO A COMMON ELECTRODE IS DISTORTED AND A MANUFACTURING METHOD THEREOF

机译:薄膜晶体管衬底,该衬底最小化了提供给普通电极的公共电压的现象,并且制造了该薄膜晶体管的制造方法

摘要

PURPOSE: A thin film transistor substrate and a manufacturing method thereof are provided to reduce power consumption by forming a data line of a region overlapped with a common electrode in a layer same as a gate line and broadening an interval between the common electrode and the data line.;CONSTITUTION: A gate electrode is connected a gate line formed on a substrate(100). A gate insulating layer(120) comprises a hole(120a) for exposing the substrate. A source electrode(140a) and a drain electrode(140b) are connected to a data line formed on the substrate through the hole. A first protective film(150), a second protective film(160), and a third protective film(180) are formed in order to cover a thin film transistor. A common electrode(170) is formed on the second protective film. A pixel electrode(190) is formed on the third protective film.;COPYRIGHT KIPO 2013
机译:目的:提供一种薄膜晶体管基板及其制造方法,以通过在与栅极线相同的层中形成与公共电极重叠的区域的数据线并加宽公共电极与数据之间的间隔来降低功耗组成:栅电极连接在衬底(100)上形成的栅线。栅极绝缘层(120)包括用于暴露衬底的孔(120a)。源电极(140a)和漏电极(140b)通过孔连接到形成在基板上的数据线。形成第一保护膜(150),第二保护膜(160)和第三保护膜(180)以覆盖薄膜晶体管。在第二保护膜上形成公共电极(170)。在第三保护膜上形成像素电极(190)。COPYRIGHTKIPO 2013

著录项

  • 公开/公告号KR20120132853A

    专利类型

  • 公开/公告日2012-12-10

    原文格式PDF

  • 申请/专利权人 LG DISPLAY CO. LTD.;

    申请/专利号KR20110051220

  • 发明设计人 PARK MUN GI;CHOI YOUNG SEOK;

    申请日2011-05-30

  • 分类号H01L29/786;G02F1/136;

  • 国家 KR

  • 入库时间 2022-08-21 16:28:32

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号