PURPOSE: An inspection apparatus and method for a pattern sapphire substrate are provided to rapidly inspect the optical extraction efficiency of a pattern sapphire substrate using an optical measuring method.;CONSTITUTION: A light source(110) irradiates a lateral side of a pattern sapphire substrate, on one side of which patterns are formed, with light. A light measurement device(120) is arranged to face one side of a pattern sapphire substrate to measure the quantity of light which enters the lateral side of the pattern sapphire substrate and is emitted to one side of the pattern sapphire substrate. An analysis device(130) analyzes the optical extraction efficiency of the pattern sapphire substrate by receiving the measured quantity of light from the light measurement device.;COPYRIGHT KIPO 2013
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