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VARIABLE CAPACITANCE STRUCTURE FOR CONTROLLING TIME DELAY IN A DIGITAL DESIGN

机译:数字设计中用于控制时间延迟的可变电容结构

摘要

PURPOSE: A variable capacitance structure is provided to obtain valid capacitance by receiving different signals through a each second stage of a plurality of MOS(metal oxide semiconductor) capacitors.;CONSTITUTION: A capacitance structure is formed(1105). Each MOSCAP(MOS capacitor) is formed respectively as a PMOSCAP(P-channel MOSCAP) or an NMOSCAP(N-channel MOSCAP) with a PMOS(P-channel MOS) transistor or an NMOS transistor(N-channel MOS). Each signal is provided in a binary value(1110). The K number of binary values is corresponded to the K number of signals. Valid capacitance is obtained in a node Ceff(1115). It is determined whether or not the valid capacitance is a desired capacitance(1120). It is determined as the valid capacitance as the desired capacitance(1125).;COPYRIGHT KIPO 2013;[Reference numerals] (1105) Forming a capacitance structure; (1110) Providing each signal in a binary value; (1115) Obtaining a valid capacitance; (1120) Desired capacitance(Ceff)?; (1125) End
机译:目的:提供可变电容结构,以通过多个MOS(金属氧化物半导体)电容器的每个第二级接收不同的信号来获得有效电容。;组成:形成电容结构(1105)。每个MOSCAP(MOS电容器)分别形成为具有PMOS(P沟道MOS)晶体管或NMOS晶体管(N沟道MOS)的PMOSCAP(P沟道MOSCAP)或NMOSCAP(N沟道MOSCAP)。每个信号以二进制值(1110)的形式提供。 K个二进制值对应于K个信号。在节点Ceff(1115)中获得有效电容。确定有效电容是否是期望电容(1120)。将其确定为有效电容,作为所需的电容(1125)。; COPYRIGHT KIPO 2013; [参考数字](1105)形成电容结构; (1110)以二进制值提供每个信号; (1115)获得有效电容; (1120)所需电容(Ceff)?; (1125)结束

著录项

  • 公开/公告号KR20120133963A

    专利类型

  • 公开/公告日2012-12-11

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.;

    申请/专利号KR20110081769

  • 发明设计人 HONG HYUN SUNG;

    申请日2011-08-17

  • 分类号H03K5/13;H01L21/822;

  • 国家 KR

  • 入库时间 2022-08-21 16:28:29

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