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MAGNETRON SPUTTERING DEVICE CAPABLE OF CONTROLLING THE MAGNETIC FIELD STRENGTH OF A MAGNETIC UNIT
MAGNETRON SPUTTERING DEVICE CAPABLE OF CONTROLLING THE MAGNETIC FIELD STRENGTH OF A MAGNETIC UNIT
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机译:能够控制磁单元的磁场强度的磁控溅射装置
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摘要
PURPOSE: A magnetron sputtering device is provided to change the magnetic field strength and shape of a target face by changing the thickness of a yoke from the opposite face of a magnetic unit without nearly moving the magnetic unit from the target face.;CONSTITUTION: A magnetron sputtering device comprises a reciprocating magnetic unit(10). The magnetic unit is composed of an inner magnet(11), an outer magnet(12), a plate-shaped yoke(14). The inner magnet is a permanent magnet in which one pole face of one polarity faces a cathode side. The outer magnet is arranged to enclose the inner magnet and faces the pole face of one polarity opposite to the polarity of the inner magnet to the cathode side. The yoke is positioned in the opposite side of the inner and outer magnets on the cathode and connects the poles of the inner and outer magnets.;COPYRIGHT KIPO 2013
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