首页> 外国专利> MAGNETRON SPUTTERING DEVICE CAPABLE OF CONTROLLING THE MAGNETIC FIELD STRENGTH OF A MAGNETIC UNIT

MAGNETRON SPUTTERING DEVICE CAPABLE OF CONTROLLING THE MAGNETIC FIELD STRENGTH OF A MAGNETIC UNIT

机译:能够控制磁单元的磁场强度的磁控溅射装置

摘要

PURPOSE: A magnetron sputtering device is provided to change the magnetic field strength and shape of a target face by changing the thickness of a yoke from the opposite face of a magnetic unit without nearly moving the magnetic unit from the target face.;CONSTITUTION: A magnetron sputtering device comprises a reciprocating magnetic unit(10). The magnetic unit is composed of an inner magnet(11), an outer magnet(12), a plate-shaped yoke(14). The inner magnet is a permanent magnet in which one pole face of one polarity faces a cathode side. The outer magnet is arranged to enclose the inner magnet and faces the pole face of one polarity opposite to the polarity of the inner magnet to the cathode side. The yoke is positioned in the opposite side of the inner and outer magnets on the cathode and connects the poles of the inner and outer magnets.;COPYRIGHT KIPO 2013
机译:目的:提供一种磁控溅射装置,通过改变磁单元相对面的磁轭厚度,而几乎不使磁单元从目标面移开,从而改变磁场强度和目标面形状。磁控溅射装置包括往复运动的磁性单元(10)。磁性单元由内部磁体(11),外部磁体(12),板状磁轭(14)组成。内磁体是一种永磁体,其中一种极性的一个极面面对阴极侧。外部磁体被布置成包围内部磁体并且朝向阴极侧面对与该内部磁体的极性相反的一种极性的极面。磁轭位于阴极上的内部和外部磁体的相对侧,并连接内部和外部磁体的磁极。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130006726A

    专利类型

  • 公开/公告日2013-01-17

    原文格式PDF

  • 申请/专利权人 CANON ANELVA CORPORATION;

    申请/专利号KR20130000245

  • 发明设计人 SASAKI MASAO;

    申请日2013-01-02

  • 分类号C23C14/35;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:50

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