MANUFACTURING METHOD OF THE EXTREME ULTRAVIOLET RADIATION PHOTOMASK AND A BLANK EXTREME ULTRAVIOLET RADIATION PHOTOMASK

摘要

PURPOSE: A manufacturing method of the extreme ultraviolet radiation photomask and a blank extreme ultraviolet radiation photomask are provided to increase absorption efficiencies of the extreme ultraviolet radiation in the absorber pattern.;CONSTITUTION: A blank extreme ultraviolet radiation photomask (100) comprises a substrate(110), a reflective layer(120), an absorber layer(140) and a CD correction layer(150). The reflective layer is arranged on the substrate. The absorber layer is arranged on the reflective layer. The CD correction layer is arranged on the absorber layer. The reflectiveg layer is composed of a structure where molybdenum and silicone are repetitively laminated by turns. The CD correction layer is composed of molybdenum silicon nitride (MoSiN).;COPYRIGHT KIPO 2013