METHOD FOR FORMING A METAL LAYER CAPABLE OF DEPOSITING CATALYST ON A PLASTIC OR GLASS SUBSTRATE UNDER 400amp;deg;C

摘要

PURPOSE: A method for forming a metal layer is provided to improve chemical reaction speed by maximizing the reaction surface of a self-formed catalyst without a mask or a template and to reduce process costs by making maximum chemical reaction with the small amount of the catalyst.;CONSTITUTION: A method for forming a metal layer comprises a step for forming a metal layer(220) on a substrate(100), a step for thermally treating the metal layer, and a step for forming a metal layer(230) on the thermally treated metal layer. The metal layer is composed of the transition metals of period 5-6 including ruthenium(Ru), platinum(Pt), rhodium(Rh), iridium(Ir), and osmium(Os).;COPYRIGHT KIPO 2013