首页> 外国专利> METHOD FOR GROWING A SEMICONDUCTOR THIN FILM AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR LIGHT EMITTING DEVICE USING THE SAME CAPABLE OF IMPROVING PROCESSING EFFICIENCY

METHOD FOR GROWING A SEMICONDUCTOR THIN FILM AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR LIGHT EMITTING DEVICE USING THE SAME CAPABLE OF IMPROVING PROCESSING EFFICIENCY

机译:生长具有相同能力的半导体薄膜的制造方法和制造发光装置的方法

摘要

PURPOSE: A method for growing a semiconductor thin film and a method for manufacturing a semiconductor light emitting device using the same are provided to etch a material remaining within a gas supply part and to prevent nozzle jam.;CONSTITUTION: Multiple wafers are loaded in a wafer holder(20). The wafers are arranged in a reaction chamber(10). A gas supply part(30) is extended along the loading direction of the wafers. Reaction gas includes an organometallic compound. The reaction gas is spread on the wafers.;COPYRIGHT KIPO 2013
机译:目的:提供一种用于生长半导体薄膜的方法和一种使用该方法制造半导体发光器件的方法,以蚀刻残留在气体供应部分内的材料并防止喷嘴堵塞。;构成:将多个晶片装入一个晶片支架(20)。将晶片布置在反应室(10)中。气体供应部(30)沿着晶片的装载方向延伸。反应气体包括有机金属化合物。反应气体散布在晶圆上; COPYRIGHT KIPO 2013

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