首页> 外国专利> OPTIMIZED DIELECTRIC REFLECTIVE DIFFRACTION GRATING

OPTIMIZED DIELECTRIC REFLECTIVE DIFFRACTION GRATING

机译:优化的介电反射衍射光栅

摘要

The present invention comprises a stack of at least four planar dielectric material layer and the upper dielectric material layer, the diffraction and etching to form the grid, the preset period of the grating is etched, a method for obtaining a reflective grating that diffracts a light beam with a predetermined spectral range, for selecting the number of the dielectric material layer with the etching layer and the characteristic steps; For samples of the frequency spectrum belonging to Use for each of a predetermined diffraction grating composed of a dielectric material layers of at least four and the predetermined interval of the lattice parameters of the etching the at least one predetermined increment pitch while changing the thickness of the step of calculating at least one of the reflection and / or transmission efficiency of the diffraction orders digitally; And from among the calculated configurations, the present invention relates to a reflective diffraction grating, characterized in that to execute the step of selecting at least one of the configuration on the basis of the criteria for the use of the method for obtaining the supplied grid. ;
机译:本发明包括至少四个平面电介质材料层和上电介质材料层的堆叠,衍射和蚀刻以形成栅格,蚀刻光栅的预设周期,获得使光衍射的反射光栅的方法具有预定光谱范围的光束,用于选择具有蚀刻层的介电材料层的数量和特征台阶;对于属于由至少四个介电材料层组成的预定衍射光栅和用于蚀刻的晶格参数的预定间隔的每个预定衍射光栅的频谱样本,至少一个预定增量间距,同时改变其厚度数字地计算衍射级的反射和/或透射效率中的至少一个的步骤;并且从计算出的配置中,本发明涉及一种反射衍射光栅,其特征在于,执行用于基于使用用于获得所提供的栅格的方法的标准来选择至少一种配置的步骤。 ;

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号