Optimized dielectric reflective diffraction grating

摘要

The present invention is directed to a reflective diffraction grating that includes a stack of at least four planar dielectric material layers, wherein the upper dielectric material layer is etched to form a diffraction grating, and wherein the etch period of the grating is predetermined, 7. A method for obtaining a grating, comprising: selecting the number and characteristics of the etch layer-containing dielectric material layers; For a sample of frequencies belonging to a spectral usage range for each predetermined diffraction grating configuration at a predetermined incremental pitch while changing the thickness of at least one of the dielectric material layers and at least one of the etch parameters of the predetermined interval grating Calculating digitally the reflection and / or transmission efficiency of at least one of the diffraction orders; And selecting at least one configuration based on a criterion according to the utilization of the provided grating, among the calculated configurations.;