首页> 外国专利> SULFONIUM COMPOUND HAVING TWO ACID SITES WITH ACID GENERATORS DIFFERENT TO EACH OTHER, A PHOTOACID GENERATOR, AND A RESIST COMPOSITION

SULFONIUM COMPOUND HAVING TWO ACID SITES WITH ACID GENERATORS DIFFERENT TO EACH OTHER, A PHOTOACID GENERATOR, AND A RESIST COMPOSITION

机译:具有两个酸性位点和两个不同酸生成剂的磷酸化合物,一种光酸生成剂和一种抗蚀剂组合物

摘要

PURPOSE: A sulfonium compound is provided to control a photon yield by accepting different absorbers into cation regions in one molecule, to have excellent miscibility in a resist, and to improve resolution and line edge roughness.;CONSTITUTION: A sulfonium compound is indicated in chemical formula 1. In chemical formula 1: X is an electron donor; R1 and R2 is selected from an alkyl group, cycloalkyl group, an aryl group, a heteroalkyl group, a heterocycloalkyl group, and a heteroaryl group, or R1, R2, and S combined with R1 are connected to each other to form a C2-7 heterocycloalkyl group; each of R4-R6 is selected from an alkyl group, a cycloalkyl group, an aryl group, a heteroalkyl group, a heterocycloalkyl group, and a heteroaryl group, or R4, R5, and S combined with R4 are connected to each other to form a C2-7 heterocycloalkyl group; and R3 is selected from cyclic alkanediyl, heterocyclic alkanediyl, arylene, and heteroarylene.;COPYRIGHT KIPO 2013
机译:用途:提供sulf化合物以通过将不同的吸收剂接受到一个分子的阳离子区域中来控制光子产率,在抗蚀剂中具有优异的可混溶性,并改善分辨率和线条边缘粗糙度。在化学式1中:X是电子给体; R1和R2选自烷基,环烷基,芳基,杂烷基,杂环烷基和杂芳基,或与R1结合的R1,R2和S相互连接形成C2- 7个杂环烷基; R4-R6各自选自烷基,环烷基,芳基,杂烷基,杂环烷基和杂芳基,或与R4结合的R4,R5和S相互连接形成C2-7杂环烷基; R3选自环烷二基,杂环烷二基,亚芳基和杂亚芳基。; COPYRIGHT KIPO 2013

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