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SULFONIUM COMPOUND HAVING TWO ACID SITES WITH ACID GENERATORS DIFFERENT TO EACH OTHER, A PHOTOACID GENERATOR, AND A RESIST COMPOSITION
SULFONIUM COMPOUND HAVING TWO ACID SITES WITH ACID GENERATORS DIFFERENT TO EACH OTHER, A PHOTOACID GENERATOR, AND A RESIST COMPOSITION
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机译:具有两个酸性位点和两个不同酸生成剂的磷酸化合物,一种光酸生成剂和一种抗蚀剂组合物
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PURPOSE: A sulfonium compound is provided to control a photon yield by accepting different absorbers into cation regions in one molecule, to have excellent miscibility in a resist, and to improve resolution and line edge roughness.;CONSTITUTION: A sulfonium compound is indicated in chemical formula 1. In chemical formula 1: X is an electron donor; R1 and R2 is selected from an alkyl group, cycloalkyl group, an aryl group, a heteroalkyl group, a heterocycloalkyl group, and a heteroaryl group, or R1, R2, and S combined with R1 are connected to each other to form a C2-7 heterocycloalkyl group; each of R4-R6 is selected from an alkyl group, a cycloalkyl group, an aryl group, a heteroalkyl group, a heterocycloalkyl group, and a heteroaryl group, or R4, R5, and S combined with R4 are connected to each other to form a C2-7 heterocycloalkyl group; and R3 is selected from cyclic alkanediyl, heterocyclic alkanediyl, arylene, and heteroarylene.;COPYRIGHT KIPO 2013
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