STAGE DEVELOPMENT METHOD FOR COATING THE SURFACE OF A SCINTILLATOR WITH A THIN FILM INSIDE A VACUUM EVAPORATOR, CAPABLE OF OBTAINING HIGH REFLECTIVITY BY FORMING A REFLECTIVE FILM HAVING HIGH UNIFORMITY AND EFFICIENCY ON THE SURFACE OF THE UNIT SCINTILLATOR

摘要

PURPOSE: A stage development method for coating the surface of a scintillator with a thin film inside a vacuum evaporator is provided to evaporate the thin film on the surfaces of the polygonal unit scintillator with a uniform thickness by a rotational force using a rotary shaft and to implement high integration and miniaturization.;CONSTITUTION: Single-layer or multi-layer thin film evaporation coating is implemented on a processed unit scintillator. The unit scintillator is selected from a group of LYSO, LSO, YSO, BGO12, YAG, GSO, CsI:Na, NaI:TI, CsI:TI, LGSO, LaBr3, LuYAP, and so on. The size of the unit scintillator has to be adjusted according to the chamber of a vacuum evaporator regardless of the size(widthlengthheight) of the unit scintillator. A thin film is evaporated on the unit scintillator by the vacuum evaporator which is an applicable one selected from a group of an E-beam evaporator based on physical vapor deposition, a thermal evaporator, an RF sputtering device, and a DC sputtering device. A stage(2) mounted inside the vacuum evaporator is easily detachable so that the vacuum evaporator is capable of being used without the stage.;COPYRIGHT KIPO 2013