首页> 外国专利> MANUFACTURING METHOD OF HIGH QUALITY MULTICRYSTALLINE SILICON INGOT USING MONOCRYSTALLINE SILICON SEED

MANUFACTURING METHOD OF HIGH QUALITY MULTICRYSTALLINE SILICON INGOT USING MONOCRYSTALLINE SILICON SEED

机译:用单晶硅种子制造高质量多晶硅锭的方法

摘要

The present invention provides a method for producing a high-quality polycrystalline silicon ingot using a single crystal silicon oxide, and more particularly melt After contact with the single crystal silicon is silicon oxide in the raw material so that the directional solidification is induced by cooling to a method for producing a polycrystalline silicon ingot is similar to the quality of the single crystal silicon. For this purpose, a single-crystal silicon seed filling the silicon raw material in a crucible and brought into contact with a rectangular single crystal silicon oxide on the top center of the silicon melt fabrication step, the silicon melt for producing a silicon melt by melting the silicon raw material with a heater surrounding the crucible the contacting step, the periphery of the heater and the crucible crucible adjustment lowers the temperature in the upper part cooled by inducing coagulation in the lower direction from the upper direction of the silicon melt derived directional solidification stage, the silicon melt as the silicon melt is solidified In the center of the upper crystal and the single crystal silicon is formed, the side and bottom of the silicon melt is made of polycrystalline silicon crystal is formed while including the silicon crystal growth step portion is added to the silicon crystal growth, the silicon crystal grown in the growth step portion is conducted by lifting the silicon crystal has a characteristic to a predetermined height to prevent breakage of the crucible according to the volume change of the silicon crystal portion. ;
机译:本发明提供了一种使用单晶氧化硅制造高质量多晶硅锭的方法,更具体地讲,是熔融后与原料单晶硅接触的是原料中的氧化硅,从而通过冷却以诱导定向凝固。用于生产多晶硅锭的方法类似于单晶硅的质量。为此,将单晶硅籽晶填充到坩埚中,并使其在硅熔体制造步骤的顶部中心与矩形单晶硅氧化物接触,该硅熔体用于通过熔融制备硅熔体。通过围绕坩埚的加热器进行硅原料的接触步骤,加热器的周围和坩埚的调节,通过从硅熔体衍生的定向凝固的上方向下方诱导凝结,降低了冷却后的上部温度。阶段,当硅熔体凝固时,硅熔体凝固在上晶体的中心并形成单晶硅,硅熔体的侧面和底部由多晶硅晶体形成,同时包括硅晶体生长步骤部分将硅添加到硅晶体生长中,在生长步骤部分中生长的硅晶体通过根据硅晶体部分的体积变化,使硅晶体具有预定高度的特性以防止坩埚破裂。 ;

著录项

  • 公开/公告号KR20130019992A

    专利类型

  • 公开/公告日2013-02-27

    原文格式PDF

  • 申请/专利权人 INSOLTEQ CO. LTD.;

    申请/专利号KR20110082328

  • 发明设计人 YUN WON TAE;KIM YOUNG JO;

    申请日2011-08-18

  • 分类号C30B11/00;C30B29/06;C30B28/06;H01L31/042;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:40

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