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SULFUR-OXIDATED COMPOUNDS SELECTIVE SILICA-BASED ADSORBENT, AND PRETREATMENT METHOD THEREOF

机译:氧化硅选择性二氧化硅基吸附剂及其预处理方法

摘要

PURPOSE: A sulfur oxide selectivity absorber and a pretreatment method thereof are provided to effectively remove a sulfur oxide in a fraction in which the sulfur oxide is included by using a non-standardized porous silica and increase the breakthrough adsorption capacity of the sulfur oxide and a breakthrough drainage by presenting detailed absorber treatment conditions like the pore size of silica, a surface area, a surface processing method, and a heat treatment temperature. CONSTITUTION: A sulfur oxide selectivity absorber is based on silica, and the silica is porous silica having the pore size of 4 ~ 9nm. The surface area of the silica is 300 ~ 600m^2/g. The pore volume of the silica is 0.01 ~ 0.3cm^2/g. The pretreatment method of the sulfur oxide selectivity absorber includes a step for the heat treatment of the silica, and the heat treatment temperature is 100 ~ 300=. Preferably, the heat treatment temperature of the silica is 100 ~ 200=.
机译:目的:提供一种硫氧化物选择性吸收剂及其预处理方法,以通过使用非标准化多孔二氧化硅有效地去除其中包含硫氧化物的馏分中的硫氧化物,并提高硫氧化物和氢的渗透吸附能力。通过介绍详细的吸收剂处理条件(例如二氧化硅的孔径,表面积,表面处理方法和热处理温度)来突破排水。组成:硫氧化物选择性吸收剂是基于二氧化硅的,二氧化硅是多孔二氧化硅,孔径为4〜9nm。二氧化硅的表面积为300〜600m ^ 2 / g。二氧化硅的孔体积为0.01〜0.3cm 2 / g。硫氧化物选择性吸收剂的预处理方法包括二氧化硅的热处理步骤,热处理温度为100〜300℃。优选地,二氧化硅的热处理温度为100〜200℃。

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