PATTERN MEASURING DEVICE AND A PATTERN MEASURING METHOD, CAPABLE OF PERFORMING THE MEASUREMENT OF PATTERNS BY IRRADIATING ELECTRONIC BEAMS

摘要

PURPOSE: A pattern measuring device and a pattern measuring method are provided to arrange a measurement region at a position identical to design data on a secondary electron image, thereby accurately measuring the line width of patterns.;CONSTITUTION: A pattern measuring device(100) comprises an electronic beam irradiating unit, a detector(9), a signal processing unit(11), a measurement region setting unit(14), a first detector(15), a second detector(16), an aligning unit(17), and a measuring unit(19). The electronic beam irradiating unit irradiates electronic beams(3a) on the surface of a specimen(8). The detector detects a secondary electron generated on the surface of the specimen. The signal processing unit generates images of the secondary electron on the surface of the specimen based on detection signals of the detector. The measurement region setting unit refers the design data of the specimen, thereby setting a measurement region on the design data. The first detector detects a characteristic portion of the design data. The second detector detects a characteristic portion of the images of the secondary electron.;COPYRIGHT KIPO 2013;[Reference numerals] (11) Signal processing unit; (12) Design data processing unit; (13) Secondary electron image processing unit; (14) Measurement region setting unit; (15) First detector; (16) Second detector; (17) Aligning unit; (18) Size adjusting unit; (19) Measuring unit; (20) Display unit; (21) Input unit; (AA) Design data