首页> 外国专利> THIN FILM TRANSISTOR HAVING AN OXIDE SEMICONDUCTOR LAYER AND AN ARRAY SUBSTRATE INCLUDING THE SAME CAPABLE OF RESTRAINING A VERTICAL CROSS TALK AND AN AFTERIMAGE DUE TO PARASITIC CAPACITANCE AND A THIN FILM TRANSISTOR PROPERTY AND IMPROVING IMAGE QUALITY

THIN FILM TRANSISTOR HAVING AN OXIDE SEMICONDUCTOR LAYER AND AN ARRAY SUBSTRATE INCLUDING THE SAME CAPABLE OF RESTRAINING A VERTICAL CROSS TALK AND AN AFTERIMAGE DUE TO PARASITIC CAPACITANCE AND A THIN FILM TRANSISTOR PROPERTY AND IMPROVING IMAGE QUALITY

机译:薄膜晶体管具有氧化物半导体层和阵列基质,包括相同的能力,因为其寄生电容以及垂直晶体管的性能,它可以限制垂直交叉讲义和故障,并且薄膜晶体管的性能和图像质量都得到改善

摘要

PURPOSE: A thin film transistor having an oxide semiconductor layer and an array substrate including the same are provided to improve the charging characteristic of a pixel electrode by reducing the parasitic capacitance due to overlap of a gate electrode, a source, and a drain electrode.;CONSTITUTION: An oxide semiconductor layer(120) has a T shape or a rotated T shape. A drain electrode(136) is separated from a source electrode(133). The drain electrode has two U-shaped ends which face each other. The end facing the source electrode is overlapped with the oxide semiconductor layer. One end of the drain electrode is overlapped with the oxide semiconductor layer.;COPYRIGHT KIPO 2013
机译:用途:提供具有氧化物半导体层的薄膜晶体管和包括该薄膜晶体管的阵列基板,以通过减小由于栅极,源极和漏极的重叠而引起的寄生电容来改善像素电极的充电特性。 ;组成:氧化物半导体层(120)具有T形或旋转的T形。漏电极(136)与源电极(133)分离。漏电极具有彼此面对的两个U形端。面对源电极的端与氧化物半导体层重叠。漏极的一端与氧化物半导体层重叠。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130063102A

    专利类型

  • 公开/公告日2013-06-14

    原文格式PDF

  • 申请/专利权人 LG DISPLAY CO. LTD.;

    申请/专利号KR20110129432

  • 发明设计人 PARK HEON KWANG;LIM DONG HUN;

    申请日2011-12-06

  • 分类号G02F1/136;H01L29/786;

  • 国家 KR

  • 入库时间 2022-08-21 16:26:58

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