DRY PLATING DEVICE, CAPABLE OF IMPROVING PRODUCTIVITY BY USING AN ION CLEANING AND A SPUTTERING WHEN PLATING CHROME IN A DRY PLATING METHOD INSIDE A VACUUM CHAMBER

摘要

PURPOSE: A dry plating device is provided to improve productivity by using an ion cleaning, a heating, and a sputtering, and to clean rollers for an alloyed body by using an ion beam when plating chrome(Cr) and CrN inside a vacuum chamber in a dry plating method.;CONSTITUTION: A dry plating device comprises a target(11) for a plated body, multiple rollers(12) for an alloyed body, a revolution jig(13), a rotation jig(14), and an ion gun(15). The target for the plated body is installed to be in accord with a central axis of a longitudinal direction within a chamber(10). The roller for the alloyed body surrounds the target for the plated body with being corresponded side by side in a longitudinal direction. Ions for plating load respectively a sputtered alloyed body by plasma. The revolution jig revolves the rollers for the alloyed body around the target for the plated body. The rotation jig rotates the rollers for the alloyed body on a central axis of the rollers for the alloyed body. The ion gun is installed at an inner wall of the chamber and fires an ion beam. The ion gun is installed at a position corresponding to the roller for the alloyed body.;COPYRIGHT KIPO 2013