PHYSICAL VAPOR DEPOSITION PLATING APPARATUS OF A GUIDE ROLL AND A PLATING METHOD THEREOF CAPABLE OF FORMING A PLATING LAYER BY ION-CLEANING AND SPUTTERING IN MULTIPLE VACUUM CHAMBERS

摘要

PURPOSE: A physical vapor deposition plating apparatus of a guide roll and a plating method thereof are provided to obtain a plating layer without cracks and to prevent the generation of waste matters which are harmful to environments.;CONSTITUTION: A physical vapor deposition plating apparatus (100) of a guide roll comprises a first auxiliary device (110), a load-lock chamber (120), a cleaning and heating chamber (130), first and second vacuum chambers (140,140'), a cooling chamber (150), an unload-lock chamber (160), a vacuum pump, first to seventh vacuum valves (a-g), and a second auxiliary device (190). The first and second vacuum chambers are close to the cleaning and heating chamber and plate the guide roller with a film. The unload-lock chamber is close to the cooling chamber. The state of the unload-lock chamber is changed between atmospheric pressure and a vacuum state to unload the guide roll. The second auxiliary device is close to the unload-lock chamber to withdraw the guide roll from the unload-lock chamber.;COPYRIGHT KIPO 2013;[Reference numerals] (AA,BB) Cathode