TEXTURE ETCHANT COMPOSITION OF A CRYSTALLINE SILICON WAFER, CAPABLE OF MANUFACTURING A TEXTURE WITH A LOW REFLECTIVITY BY FORMING A UNIFORM MICRO PYRAMID STRUCTURE, AND AN ETCHING METHOD OF TEXTURE

摘要

PURPOSE: A texture etchant composition of a crystalline silicon wafer is provided to minimize quality deviation, and to improve uniformity of a texture, thereby maximizing absorption amount of a solar light and to reduce light reflectivity.;CONSTITUTION: A texture etchant composition of a crystalline silicon wafer comprises a polycarboxylic acid-based polymer. The polycarboxylic acid-based polymer includes a repeating unit represented by chemical formula 1. In chemical formula 1, each of R1, R2, and R3 is independently hydrogen, C1-5 alkyl group, or -(CH2)m2COOM2; In chemical formula 1, each of M1 and M2 is hydrogen alkali metal, alkali earth metal, ammonium group, or C1-10 alkyl ammonium group substitutable by a hydroxyl group; and each of m1 and m2 is independently an integer from 0-2.;COPYRIGHT KIPO 2013