首页> 外国专利> METHOD FOR FORMING AN OPTICAL WAVEGUIDE ON A SILICON WAFER CAPABLE OF REDUCING MANUFACTURING COSTS

METHOD FOR FORMING AN OPTICAL WAVEGUIDE ON A SILICON WAFER CAPABLE OF REDUCING MANUFACTURING COSTS

机译:在可降低制造成本的硅晶圆上形成光学波导的方法

摘要

PURPOSE: A method for forming an optical waveguide on a silicon wafer is provided to form an optical waveguide directly on a silicon wafer, thereby enabling manufacturing of an optical communication chip on the same wafer with a CPU or a memory chip and thus remarkably reducing manufacturing costs.;CONSTITUTION: A method comprises the steps of: forming a top insulation pattern(3a) on a substrate(1); forming a protrusion part(1a) by etching the substrate; forming a side insulation pattern(5a) which covers the side of the protrusion part; forming a core pattern(1c) which is surrounded with the top, the side, and a lower insulation patterns by forming the lower insulation pattern(5a) through thermal oxidation; and removing the top and side insulation patterns.;COPYRIGHT KIPO 2013
机译:用途:提供了一种在硅晶片上形成光波导的方法,以在硅晶片上直接形成光波导,从而能够与CPU或存储芯片在同一晶片上制造光通信芯片,从而显着减少了制造组成:一种方法包括以下步骤:在衬底(1)上形成顶部绝缘图案(3a);通过蚀刻基板形成突起部(1a)。形成覆盖突出部分的侧面的侧面绝缘图案(5a);通过热氧化形成下部绝缘图案(5a),形成被顶部,侧面和下部绝缘图案围绕的芯图案(1c);并去除顶部和侧面的绝缘图案。; COPYRIGHT KIPO 2013

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