PLASMA PROCESS DEVICES HAVING A CORROSION RESISTANT COMPONENTS INCLUDING A STAINLESS STEEL AND INNER LAYER COATED ON THE OUTER SIDE OF TANTALUM

摘要

PURPOSE: Plasma process devices are provided to be exposed to plasma-treatment gas without collision.;CONSTITUTION: A plasma treatment chamber maintains a vacuum state, and limits plasma treatment gas. A gas distribution member (20) and a substrate support member (30) are located in the plasma treatment chamber, are separated from each other by a plasma region, and emits plasma treatment gas into the plasma treatment chamber. An energy source (38) is in electric communication state, and converts a part of the plasma treatment gas into plasma, in a high plasma region (36). A corrosion resistant component is located in a plasma treatment chamber, is exposed to the plasma treatment gas, and has a stainless steel inner layer (42) coated with tantalum outer layer.;COPYRIGHT KIPO 2013