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METHOD OF MANUFACTURING A MOLYBDENUM METAL TARGET USING RF PLASMA, CAPABLE OF HAVING A MINUTE CRYSTAL SIZE AND AN EVEN CRYSTAL TEXTURE
METHOD OF MANUFACTURING A MOLYBDENUM METAL TARGET USING RF PLASMA, CAPABLE OF HAVING A MINUTE CRYSTAL SIZE AND AN EVEN CRYSTAL TEXTURE
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机译:利用射频等离子体制造钼金属靶的方法,该靶具有微小的晶体尺寸和均匀的晶体纹理
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摘要
PURPOSE: A method of manufacturing a molybdenum metal target using RF plasma is provided to simplify a manufacturing process by manufacturing a molybdenum metal target by weather evaporation-condensation coating molybdenum with plasma of a high temperature by using RF plasma.;CONSTITUTION: A method of manufacturing a molybdenum metal target using RF plasma comprises the following steps: a molybdenum metal powder is charged in a powder supplier (120); a reaction chamber (110) inside is substituted for an inactive or a hydrogen reduction atmosphere; RF plasma is generated inside a reaction chamber; a substrate positioned inside the reaction chamber is rotated and moved; a molybdenum metal powder is injected to an inside of the RF plasma; the molybdenum metal powder is melted and vaporized through the RF plasma; and a coating layer is formed by colliding the molybdenum metal melted and vaporized with the substrate.;COPYRIGHT KIPO 2013
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