首页> 外国专利> METHOD OF MANUFACTURING A MOLYBDENUM METAL TARGET USING RF PLASMA, CAPABLE OF HAVING A MINUTE CRYSTAL SIZE AND AN EVEN CRYSTAL TEXTURE

METHOD OF MANUFACTURING A MOLYBDENUM METAL TARGET USING RF PLASMA, CAPABLE OF HAVING A MINUTE CRYSTAL SIZE AND AN EVEN CRYSTAL TEXTURE

机译:利用射频等离子体制造钼金属靶的方法,该靶具有微小的晶体尺寸和均匀的晶体纹理

摘要

PURPOSE: A method of manufacturing a molybdenum metal target using RF plasma is provided to simplify a manufacturing process by manufacturing a molybdenum metal target by weather evaporation-condensation coating molybdenum with plasma of a high temperature by using RF plasma.;CONSTITUTION: A method of manufacturing a molybdenum metal target using RF plasma comprises the following steps: a molybdenum metal powder is charged in a powder supplier (120); a reaction chamber (110) inside is substituted for an inactive or a hydrogen reduction atmosphere; RF plasma is generated inside a reaction chamber; a substrate positioned inside the reaction chamber is rotated and moved; a molybdenum metal powder is injected to an inside of the RF plasma; the molybdenum metal powder is melted and vaporized through the RF plasma; and a coating layer is formed by colliding the molybdenum metal melted and vaporized with the substrate.;COPYRIGHT KIPO 2013
机译:用途:提供一种使用RF等离子体制造钼金属靶的方法,以简化制造工艺,方法是通过使用RF等离子通过高温等离子的天气蒸发冷凝涂覆钼来制造钼金属靶。使用RF等离子体制造钼金属靶包括以下步骤:将钼金属粉末装入粉末供应器(120)中;内部的反应室(110)代替惰性或氢还原气氛。 RF等离子体在反应室内产生;旋转并移动位于反应室内的基板。将钼金属粉末注入到RF等离子体的内部。钼金属粉末通过射频等离子体熔化并汽化。熔融并蒸发的钼金属与基材碰撞形成涂层。; COPYRIGHT KIPO 2013

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