首页> 外国专利> THIN FILM TRANSISTOR CAPABLE OF LOWERING THE OPERATING TEMPERATURE OF A DEVICE AND OBTAINING HIGH RELIABILITY

THIN FILM TRANSISTOR CAPABLE OF LOWERING THE OPERATING TEMPERATURE OF A DEVICE AND OBTAINING HIGH RELIABILITY

机译:薄膜晶体管,可降低设备的工作温度并获得高可靠性

摘要

PURPOSE: A thin film transistor is provided to reduce the deterioration of a device by forming separated channels for decreasing the operating temperature and power of the device.;CONSTITUTION: A gate electrode (120) is formed on one surface of a substrate (110). A gate insulating layer (130) is formed on the upper part of the substrate and covers the gate electrode. A semiconductor layer includes a channel region (140), a source region (150), and a drain region (160). The channel region is formed between the source region and the drain region. The channel region includes channels which are separated from each other. A passivation layer (170) covers a part of the semiconductor layer.;COPYRIGHT KIPO 2013
机译:目的:提供一种薄膜晶体管,通过形成分离的沟道来降低器件的工作温度和功率,以减少器件的劣化。组成:栅电极(120)形成在基板(110)的一个表面上。栅绝缘层(130)形成在基板的上部上并覆盖栅电极。半导体层包括沟道区(140),源极区(150)和漏极区(160)。沟道区形成在源极区和漏极区之间。通道区域包括彼此分离的通道。钝化层(170)覆盖半导体层的一部分。; COPYRIGHT KIPO 2013

著录项

  • 公开/公告号KR20130087914A

    专利类型

  • 公开/公告日2013-08-07

    原文格式PDF

  • 申请/专利权人 SNU R&DB FOUNDATION;

    申请/专利号KR20120009171

  • 发明设计人 CHOI SUNG HWAN;HAN MIN KOO;

    申请日2012-01-30

  • 分类号H01L29/786;H01L21/336;

  • 国家 KR

  • 入库时间 2022-08-21 16:26:33

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