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METHOD FOR MANUFACTURING A NITRIDE-GALLIUM-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE CAPABLE OF REDUCING OHMIC CONTACT RESISTANCE
METHOD FOR MANUFACTURING A NITRIDE-GALLIUM-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE CAPABLE OF REDUCING OHMIC CONTACT RESISTANCE
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机译:具有降低欧姆接触电阻的氮化镓基半导体发光器件的制造方法
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摘要
PURPOSE: A method for manufacturing a nitride-gallium-based semiconductor light emitting device is provided to improve electrical conductivity by increasing the mobility and the doping concentration of holes.;CONSTITUTION: A light emitting structure (140) is formed on a substrate. The light emitting structure includes an n-type semiconductor layer, an active layer, and a p-type semiconductor layer (130). A first thermal process is performed on the p-type semiconductor layer. An organic cleaning process is performed on the p-type semiconductor layer. A mask pattern (160) is formed on the upper surface of the p-type semiconductor layer.;COPYRIGHT KIPO 2013
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