首页> 外国专利> METHOD FOR MANUFACTURING A NITRIDE-GALLIUM-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE CAPABLE OF REDUCING OHMIC CONTACT RESISTANCE

METHOD FOR MANUFACTURING A NITRIDE-GALLIUM-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE CAPABLE OF REDUCING OHMIC CONTACT RESISTANCE

机译:具有降低欧姆接触电阻的氮化镓基半导体发光器件的制造方法

摘要

PURPOSE: A method for manufacturing a nitride-gallium-based semiconductor light emitting device is provided to improve electrical conductivity by increasing the mobility and the doping concentration of holes.;CONSTITUTION: A light emitting structure (140) is formed on a substrate. The light emitting structure includes an n-type semiconductor layer, an active layer, and a p-type semiconductor layer (130). A first thermal process is performed on the p-type semiconductor layer. An organic cleaning process is performed on the p-type semiconductor layer. A mask pattern (160) is formed on the upper surface of the p-type semiconductor layer.;COPYRIGHT KIPO 2013
机译:目的:提供一种用于制造氮化镓基半导体发光器件的方法,以通过增加空穴的迁移率和掺杂浓度来提高导电性。组成:在基板上形成发光结构(140)。发光结构包括n型半导体层,有源层和p型半导体层(130)。在p型半导体层上执行第一热处理。在p型半导体层上执行有机清洁工艺。在p型半导体层的上表面上形成掩模图案(160)。COPYRIGHTKIPO 2013

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