首页> 外国专利> CONCENTRATION COMPUTING METHOD AND CONCENTRATION CONTROL SYSTEM FOR DEVELOPER INCLUDING PHOTORESIST

CONCENTRATION COMPUTING METHOD AND CONCENTRATION CONTROL SYSTEM FOR DEVELOPER INCLUDING PHOTORESIST

机译:含光致抗蚀剂的显影剂浓度计算方法及浓度控制系统

摘要

PURPOSE: A method for measuring the concentration of a developer including photoresist and a concentration regulating device are provided to reduce a waste of the developer by recovering the developer spread on a substrate when a developing process is progressing and to reduce the amount of the developer utilized for the developing process by directly regulating the concentration of the recovered developer. CONSTITUTION: A method for measuring the concentration of a developer including photoresist includes the following steps of: dissolving the photoresist in a developer of reference concentration and measuring absorbance with a nephelometer while increasing the amount of the photoresist dissolved in the developer at a predetermined speed; measuring a difference of the concentration of the developer per each of measured absorbance values with neutralimetry and obtaining a correlation function between the absorbance and a concentration error of the developer; measuring the concentration of carbonate by measuring the absorbance of a developer sample with a nephelometer and measuring the conductivity of the developer sample with a nephelometer and the speed of ultrasonic waves; and calculating the concentration of the developer sample by using the measured absorbance, the concentration of the carbonate, the correlation function between the absorbance and the concentration error of the developer, the correlation function between the concentration of the carbonate and the concentration error of the developer, and the reference concentration of the developer. [Reference numerals] (5) Densitometer; (AA) Ultrapure water; (BB) Undiluted solution of a developer (25%); (CC) Regeneration solution for a developer; (DD) Developer with reference concentration; (EE,FF) Developing machine; (GG) System for regenerating a developer
机译:目的:提供一种用于测量显影剂浓度的方法,该方法包括光致抗蚀剂和浓度调节装置,以通过在进行显影工艺时回收散布在基板上的显影剂来减少显影剂的浪费并减少显影剂的使用量。通过直接调节回收的显影剂的浓度进行显影。构成:一种用于测量包括光致抗蚀剂的显影剂浓度的方法,包括以下步骤:将光致抗蚀剂溶解在参考浓度的显影剂中,并使用浊度计测量吸光度,同时以预定速度增加溶解在显影剂中的光致抗蚀剂的量;用中和法测量每个测得的吸光度值的显影剂浓度差,并获得吸光度和显影剂浓度误差之间的相关函数;通过使用浊度计测量显影剂样品的吸光度并使用浊度计测量显影剂样品的电导率和超声波的速度来测量碳酸盐的浓度;并通过使用测得的吸光度,碳酸盐浓度,吸光度与显影剂浓度误差之间的相关函数,碳酸盐浓度与显影剂浓度误差之间的相关函数来计算显影剂样品的浓度,以及显影剂的参考浓度。 [附图标记](5)密度计; (AA)超纯水; (BB)显影剂的未稀释溶液(25%); (CC)针对开发人员的再生解决方案; (DD)具有参考浓度的显影剂; (EE,FF)显影机; (GG)用于再生显影剂的系统

著录项

  • 公开/公告号KR20130102184A

    专利类型

  • 公开/公告日2013-09-17

    原文格式PDF

  • 申请/专利权人 SGENT CO. LTD.;

    申请/专利号KR20120023204

  • 申请日2012-03-07

  • 分类号G01N15/06;G01N21/31;G03F7/32;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 16:26:16

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