Photosensitive resin composition for column spacer having enhanced storage stability, paten stiffness and strength of stability

摘要

PURPOSE: A photo-sensitive resin composition for a column spacer is provided to secure the excellent storage stability and development property, and to obtain a pattern with the wide upper diameter. CONSTITUTION: A photo-sensitive resin composition for a column spacer contains a copolymer A, and a copolymer B. The copolymer A contains 2-tetrahydropyranyl group containing polymerizable monomer marked with chemical formula 1, and an epoxy group-containing polymerizable monomer. In the chemical formula 1, R1 is either a hydrogen atom or an alkyl group with 1~5 carbons. The copolymer B contains a compound marked with chemical formula 2.