PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM RESIST HAVING FAVORABLE STORAGE STABILITY, AND ITS USE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive dry film resist which can be developed with an aqueous solution, which forms a favorable pattern and which have excellent storage stability and little change in the solubility in an alkali with time, and to provide a use method thereof.;SOLUTION: The photosensitive resin composition contains as the essential components: (A) a soluble polyimide containing a polymerizable functional group and a carboxyl group and/or a hydroxyl group; (B) a (meth)acrylic compound; and (C) at least one kind of additive selected from a group consisting of a polymerization inhibitor, a stabilizer and an antioxidant. The photosensitive dry film is produced from the above composition. A use method of the resist is also provided.;COPYRIGHT: (C)2005,JPO&NCIPI