Positive-Type Photosensitive Siloxane Composition, Cured Film Formed Therefrom and Device Having the Cured Film

摘要

The present invention is a high heat resistance, high transparency, planarization for the TFT substrate film having a low dielectric constant polarity properties, the interlayer insulating film, or as to provide a high-sensitivity positive photosensitive siloxane composition of used in the core or cladding material formed of the optical waveguide, the composition It is a siloxane polymer, a quinonediazide compound, and contains a solvent, a positive photosensitive siloxane composition transmittance per film thickness of not less than 3 ㎛ 95% at 400 nm wavelength of a cured film of the composition. ; The positive photosensitive siloxane, a cured film