Device and method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine

摘要

1. Device and method for measuring a wavefront of an optical imaging system and microlithography projection exposure machine. ; 2.1 The invention groups attached micro lithography apparatus and a method for such an apparatus and the wavefront measurement of the optical imaging system exposure relates. ; 2.2 In accordance with the present invention, wherein the device are disposed to the object side of the subject imaging system, the object-side periodic structure (2), the optical element 1 and the measured object side having a periodic structure wave generating unit including a light source for irradiating with radiation, and the other hand is placed on the image side of the subject imaging systems, image-side periodic structure (4) optical element (3) with the imaged object side and the image side periodic structure having a periodic includes detection unit to the detection unit having a device for detecting the overlapping pattern of the structure. Doedoe designed to restrict each spectrum (6) of the measuring radiation emitted from the wave front generated yunitneun field point (7), measuring the radiation is at least one pupil plane of the optical imaging system, in each case in which the radiation from each field point (7) is one of the sub-area 8 only to the design of the irradiation (9). ; 2.3 purpose, for example, a wavefront measurement of the microlithography projection lens.