首页>
外国专利>
METHOD OF MANUFACTURING FIVE-GRAY SCALE PHOTOMASK AND FIVE-GRAY SCALE PHOTOMASK, AND PATTERN TRANSFER METHOD
METHOD OF MANUFACTURING FIVE-GRAY SCALE PHOTOMASK AND FIVE-GRAY SCALE PHOTOMASK, AND PATTERN TRANSFER METHOD
展开▼
机译:制造五级和五级光电掩模的方法以及图案转移方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A manufacturing method of 5 gradation photomask, a 5 gradation photomask and a pattern transcription method are provided to manufacture the 5 gradation photomask which has different exposure light transmittance. A light shielding portion(11), a light-transmitting part(12), and a mask pattern comprising the first semi light-transmitting part(13A), the second semi light-transmitting part(13B), and the third semi light-transmitting part(13C) which have different exposure light transmittance. A photo mask blank having the first semi light-transmitting layer(16) and a light-shielding layer(15) are prepared. The first resist pattern is molded by forming and developing the resist film formed on the light-shielding layer of the photo mask blank. The first patterning is performed by etching the light-shielding layer. After the first resist pattern is removed, the second resist pattern is molded.
展开▼